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ISP NAS of Ukraine


  1. M.Ya. Valakh, V.S. Lysenko, G.Yu. Rudko, N.E. Shahraychuk, A.N. Nazarov Enhanced activation of implanted phosporus in Si under RF plasma treatment Nucl. Instr. Meth. Phys. Res. (B), vol.44, No.3, pp.146-148 (1989)

  2. V.S. Lysenko, A.N. Nazarov, S.A. Valiev, I.M. Zaritskii, T.E. Rudenko, and A.S. Tkachenko EPR and TSCR Investigations of Implanted Al-SiO2-Si Systems Treated with RF Plasma Discharge Phys. Stat. Sol. (a) vol.113, pp.653-665 (1989)

  3. V.S. Lysenko, A.N. Nazarov, G.A. Naumovets, V.B. Popov, and A.S. Tkachenko Manifestation of Hydrogen in Al-SiO2-Si Structures Subjected to a RF Plasma Annealing Phys. Stat. Sol. (a) vol.112, K9-K12 (1989)

  4. V.S. Lysenko, A.N. Nazarov, I.M. Zaritskii, G. Serfozo, G. Battistig, J. Gyulai, and L. Dozsa RF Plasma Modification of Heavily Destroyed Ion Implanted Subsurface Silicon Layers Phys. Stat. Sol. (a), vol.115, pp.75-80 (1989)

  5. V.S. Lysenko, I.N. Osiyuk, V.I. Turchanikov, A.N. Nazarov Transformation of Si-SiO2-Al structures under RF plasma treatment Appl. Surf. Science, vol.39, No.2, pp.388-391 (1989)